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1 reactive ion etching
reactive ion etching reaktives Ionenätzen nEnglish-German dictionary of Electrical Engineering and Electronics > reactive ion etching
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2 deep reactive ion etching
English-German dictionary of Electrical Engineering and Electronics > deep reactive ion etching
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3 RIE
English-German dictionary of Electrical Engineering and Electronics > RIE
См. также в других словарях:
Reactive-ion etching — (RIE) is an etching technology used in microfabrication. It uses chemically reactive plasma to remove material deposited on wafers. The plasma is generated under low pressure (vacuum) by an electromagnetic field. High energy ions from the plasma… … Wikipedia
Reactive-ion etching — Gravure ionique réactive La gravure ionique réactive ou gravure par ions réactifs très souvent appelée par son acronyme anglophone, RIE (pour Reactive Ion Etching), est une technique de gravure sèche des semi conducteurs. Il s agit d une… … Wikipédia en Français
Reactive Ion Etching — Gravure ionique réactive La gravure ionique réactive ou gravure par ions réactifs très souvent appelée par son acronyme anglophone, RIE (pour Reactive Ion Etching), est une technique de gravure sèche des semi conducteurs. Il s agit d une… … Wikipédia en Français
reactive ion etching — reaktyvusis joninis ėsdinimas statusas T sritis radioelektronika atitikmenys: angl. reactive ion etching; reactive ion milling vok. reaktives Ionenätzen, n rus. реактивное ионное травление, n pranc. décapage ionique réactif, m … Radioelektronikos terminų žodynas
Deep reactive-ion etching — (DRIE) is a highly anisotropic etch process used to create deep penetration, steep sided holes and trenches in wafers, with aspect ratios of 20:1 or more. It was developed for microelectromechanical systems (MEMS), which require these features,… … Wikipedia
Deep Reactive Ion Etching — Reaktives Ionentiefenätzen (engl. Deep Reactive Ion Etching, DRIE), eine Weiterentwicklung des reaktiven Ionenätzen (RIE), ist ein hoch anisotroper Trockenätzprozess für die Herstellung von Mikrostrukuren in Silicium mit Aspektverhältnissen (das… … Deutsch Wikipedia
reactive ion milling — reaktyvusis joninis ėsdinimas statusas T sritis radioelektronika atitikmenys: angl. reactive ion etching; reactive ion milling vok. reaktives Ionenätzen, n rus. реактивное ионное травление, n pranc. décapage ionique réactif, m … Radioelektronikos terminų žodynas
reactive ion-beam etching — reaktyvusis jonpluoštis ėsdinimas statusas T sritis radioelektronika atitikmenys: angl. reactive ion beam etching vok. reaktives Ionenstrahlätzen, n rus. реактивное ионно пучковое травление, n pranc. décapage par faisceau d ions réactifs, m … Radioelektronikos terminų žodynas
Etching (microfabrication) — Etching tanks used to perform Piranha, Hydrofluoric acid or RCA clean on 4 inch wafer batches at LAAS technological facility in Toulouse, France Etching is used in microfabrication to chemically remove layers from the surface of a wafer during… … Wikipedia
Ion-beam sculpting — Ion Beam scultping is a term used to describe a two step process to make solid state nanopores. The term itself was coined by Golovchenko and co workers at Harvard in the paper Ion beam sculpting at nanometer length scales [J. Li, D. Stein, C.… … Wikipedia
Ion beam — An ion beam is a type of particle beam consisting of ions. Ion beams have many uses in electronics manufacturing (principally ion implantation) and other industries. Today s ion beam sources are typically derived from the mercury vapor thrusters… … Wikipedia
